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Jul 17

SEMv2: Table Separation Line Detection Based on Instance Segmentation

Table structure recognition is an indispensable element for enabling machines to comprehend tables. Its primary purpose is to identify the internal structure of a table. Nevertheless, due to the complexity and diversity of their structure and style, it is highly challenging to parse the tabular data into a structured format that machines can comprehend. In this work, we adhere to the principle of the split-and-merge based methods and propose an accurate table structure recognizer, termed SEMv2 (SEM: Split, Embed and Merge). Unlike the previous works in the ``split'' stage, we aim to address the table separation line instance-level discrimination problem and introduce a table separation line detection strategy based on conditional convolution. Specifically, we design the ``split'' in a top-down manner that detects the table separation line instance first and then dynamically predicts the table separation line mask for each instance. The final table separation line shape can be accurately obtained by processing the table separation line mask in a row-wise/column-wise manner. To comprehensively evaluate the SEMv2, we also present a more challenging dataset for table structure recognition, dubbed iFLYTAB, which encompasses multiple style tables in various scenarios such as photos, scanned documents, etc. Extensive experiments on publicly available datasets (e.g. SciTSR, PubTabNet and iFLYTAB) demonstrate the efficacy of our proposed approach. The code and iFLYTAB dataset are available at https://github.com/ZZR8066/SEMv2.

  • 9 authors
·
Jan 11, 2024

Modeling the Distribution of Normal Data in Pre-Trained Deep Features for Anomaly Detection

Anomaly Detection (AD) in images is a fundamental computer vision problem and refers to identifying images and image substructures that deviate significantly from the norm. Popular AD algorithms commonly try to learn a model of normality from scratch using task specific datasets, but are limited to semi-supervised approaches employing mostly normal data due to the inaccessibility of anomalies on a large scale combined with the ambiguous nature of anomaly appearance. We follow an alternative approach and demonstrate that deep feature representations learned by discriminative models on large natural image datasets are well suited to describe normality and detect even subtle anomalies in a transfer learning setting. Our model of normality is established by fitting a multivariate Gaussian (MVG) to deep feature representations of classification networks trained on ImageNet using normal data only. By subsequently applying the Mahalanobis distance as the anomaly score we outperform the current state of the art on the public MVTec AD dataset, achieving an AUROC value of 95.8 pm 1.2 (mean pm SEM) over all 15 classes. We further investigate why the learned representations are discriminative to the AD task using Principal Component Analysis. We find that the principal components containing little variance in normal data are the ones crucial for discriminating between normal and anomalous instances. This gives a possible explanation to the often sub-par performance of AD approaches trained from scratch using normal data only. By selectively fitting a MVG to these most relevant components only, we are able to further reduce model complexity while retaining AD performance. We also investigate setting the working point by selecting acceptable False Positive Rate thresholds based on the MVG assumption. Code available at https://github.com/ORippler/gaussian-ad-mvtec

  • 3 authors
·
May 28, 2020

Addressing Class Imbalance and Data Limitations in Advanced Node Semiconductor Defect Inspection: A Generative Approach for SEM Images

Precision in identifying nanometer-scale device-killer defects is crucial in both semiconductor research and development as well as in production processes. The effectiveness of existing ML-based approaches in this context is largely limited by the scarcity of data, as the production of real semiconductor wafer data for training these models involves high financial and time costs. Moreover, the existing simulation methods fall short of replicating images with identical noise characteristics, surface roughness and stochastic variations at advanced nodes. We propose a method for generating synthetic semiconductor SEM images using a diffusion model within a limited data regime. In contrast to images generated through conventional simulation methods, SEM images generated through our proposed DL method closely resemble real SEM images, replicating their noise characteristics and surface roughness adaptively. Our main contributions, which are validated on three different real semiconductor datasets, are: i) proposing a patch-based generative framework utilizing DDPM to create SEM images with intended defect classes, addressing challenges related to class-imbalance and data insufficiency, ii) demonstrating generated synthetic images closely resemble real SEM images acquired from the tool, preserving all imaging conditions and metrology characteristics without any metadata supervision, iii) demonstrating a defect detector trained on generated defect dataset, either independently or combined with a limited real dataset, can achieve similar or improved performance on real wafer SEM images during validation/testing compared to exclusive training on a real defect dataset, iv) demonstrating the ability of the proposed approach to transfer defect types, critical dimensions, and imaging conditions from one specified CD/Pitch and metrology specifications to another, thereby highlighting its versatility.

  • 5 authors
·
Jul 14, 2024

Automated Grain Boundary (GB) Segmentation and Microstructural Analysis in 347H Stainless Steel Using Deep Learning and Multimodal Microscopy

Austenitic 347H stainless steel offers superior mechanical properties and corrosion resistance required for extreme operating conditions such as high temperature. The change in microstructure due to composition and process variations is expected to impact material properties. Identifying microstructural features such as grain boundaries thus becomes an important task in the process-microstructure-properties loop. Applying convolutional neural network (CNN) based deep-learning models is a powerful technique to detect features from material micrographs in an automated manner. Manual labeling of the images for the segmentation task poses a major bottleneck for generating training data and labels in a reliable and reproducible way within a reasonable timeframe. In this study, we attempt to overcome such limitations by utilizing multi-modal microscopy to generate labels directly instead of manual labeling. We combine scanning electron microscopy (SEM) images of 347H stainless steel as training data and electron backscatter diffraction (EBSD) micrographs as pixel-wise labels for grain boundary detection as a semantic segmentation task. We demonstrate that despite producing instrumentation drift during data collection between two modes of microscopy, this method performs comparably to similar segmentation tasks that used manual labeling. Additionally, we find that naïve pixel-wise segmentation results in small gaps and missing boundaries in the predicted grain boundary map. By incorporating topological information during model training, the connectivity of the grain boundary network and segmentation performance is improved. Finally, our approach is validated by accurate computation on downstream tasks of predicting the underlying grain morphology distributions which are the ultimate quantities of interest for microstructural characterization.

  • 8 authors
·
May 11, 2023